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Sunday, August 16, 2015
TCNCP with OSP based surface finish
Thursday, August 13, 2015
Power cycling
Wednesday, August 12, 2015
PoP Evolution
Increasing performance requirements drives larger logic die and package body size, thin core or coreless/ETS substrates, all of which increase warpage that make meeting tightening coplanarity requirements, very challenging. Package height constraints further necessitate thin die/substrates that increase coplanarity/warpage concerns.
In addition, higher memory performance drives need for fine pitch memory, that require smaller ball sizes, which translates to smaller collapsed height or clearance between top & bottom packages.
MLP-PoP is an approach that (1) alleaviates above concerns of warpage & coplanarity, by making use of an overmold that adds structural robustness to the package and (2) enables fine pitch memory by improving the clearance between the 2 packages, without needing excessive die thinning.
This may be MLP-ED (exposed die) or MLP-OM (overmold). ED reduces overall package thickness but slightly higher cop/warpage is the resulting tradeoff. Further, this may be MLP-CUF v/s MLP-MUF
However, MLP-PoP requires additional molding processes - and comes at a premium (cost). Lower cost alternative is to use BD PoP with CuBOL for the bottom package, that increases package to package clearance by reducing die-to-substrate standoff.
Monday, August 10, 2015
Saturday, August 8, 2015
L-Gate methodology
L-1: Explore / PC1
L 0: Define / PC2 & T/O
L 1: Enable/BKM determination
L 2: Implement/BKM optimization & corner
L 3: Qualify/BKM validate
L 4: Ramp/PRU
L 5: Production/HVM
Saturday, August 1, 2015
TSV process
Front side:
Etch/Dielectric liner/barrier/seed/fill/RDL/passivation/landing pad
Back side:
Temp bond/backgrind & TSV reveal/MEOL/passivation/bump & debond
Etch/Dielectric liner/barrier/seed/fill/RDL/passivation/landing pad
Back side:
Temp bond/backgrind & TSV reveal/MEOL/passivation/bump & debond
2.5D flows: CoW v/s CoS
2 primary flows: CoS and CoW (or CoC)
CoW/CoC may be chip-first (attach before interposer MEOL) or chip-last (after interposer MEOL)
Chip-first requires committing expensive die on interposer, without knowing interposer yield, but allows chip-attach on full thickness wafers. [Concern: Assemblly yield]
Chip-last uses KGD & finished interposer (or KGI) and therefore promises higher assembly yield, but requires thin interposer wafer handling (WSS) and therefore increases assembly cost. [Concern: Assembly cost]
CoS leverages existing flip-chip assembly infrastructure and allows test insertion before committing expensive BOM (logic/ASIC/memory die), but large interposer attach to substrate first, generates warpage concerns that may challenge ASIC/logic/memory die attach to interposer. [Concern: Assembly yield for large die]
CoW/CoC may be chip-first (attach before interposer MEOL) or chip-last (after interposer MEOL)
Chip-first requires committing expensive die on interposer, without knowing interposer yield, but allows chip-attach on full thickness wafers. [Concern: Assemblly yield]
Chip-last uses KGD & finished interposer (or KGI) and therefore promises higher assembly yield, but requires thin interposer wafer handling (WSS) and therefore increases assembly cost. [Concern: Assembly cost]
CoS leverages existing flip-chip assembly infrastructure and allows test insertion before committing expensive BOM (logic/ASIC/memory die), but large interposer attach to substrate first, generates warpage concerns that may challenge ASIC/logic/memory die attach to interposer. [Concern: Assembly yield for large die]
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